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CVD graphene films

Graphene monolayer film is obtained by chemical vapor deposition on the surface of a copper foils at a high temperature of 800-900 ° C from a mixture of methane, hydrogen and argon gases. A graphene film is formed on a metal foil and can then be transferred to any smooth surface. Description of the produced CVD-graphene film.

Film graphene is used in the following areas:

  • microelectronics, photonics
  • optics, optoelectronics
  • flexible transparent electrodes
  • sensors and sensors

Graphene in the form of a film is actively studied and applied in the above areas and several dozens of scientific articles have been made on the work performed, which can be found in the section Our scientific works.

 

Graphene oxide and reduced graphene oxide

Graphene oxide is obtained chemically in several steps from the initial raw material - graphite. At the first stage, graphite oxide is made from graphite by intercalating the acid and chemicals into the interlayer space of graphite (modified Hammers method). At the second stage, the distance between the layers of graphite oxide is expanded and a suspension of graphene oxide is obtained — individual single-layer particles. Then it is dried to obtain graphene oxide powder. Or chemically remove the oxide groups to produce reduced graphene oxide.

Graphene oxide and reduced graphene oxide are used in the following areas:

  • supercapacitors
  • filters and membranes
  • biosensors
  • composite materials
  • antibacterial coatings

 

2D materials

Chalgogenides of transition metals on dielectric substrates. MoS2 and WS2 monolayer films are obtained by chemical vapor deposition on the surface of sapphire or silicon with silicon oxide.

A detailed description of the method of preparation and analysis of samples is described in our article published in the journal 
MICROCRYSTALLINE, NANOCRYSTALLINE, POROUS, AND COMPOSITE SEMICONDUCTORS

 

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